Manufacturier : Tystar
Role of the equipment
The Tytan furnace is used for various thermal treatments like diffusion, dry and wet oxydation and also deposition of nitride and polysilicon thin films.
• Tube 3: LPCVD with SiH4, SiH2Cl2 or NH3
• Internal torche for wet oxydation
Examples of available processes and services
• Nitride deposition for membrane
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