Manufacturer : Brewer
Role of the equipment
The Brewer CEE100 is a programmable spin-coater platform for the deposition thin films like photoresist and ebeam resists, particulary for the use of thick resists and spinning of photomask plates.
• Automated with programmable recipes (ramp, spinning speed, acceleration, deceleration)
• Photomasks adaptator, 8in and 6in wafers
Examples of available processes and services
• Photoresist and ebeam resists spin coating
Academic | Private sector Rate :