> Focused Ion beam and Scanning Electron Microscope (FIB/SEM)

Model : Tescan LYRA 3 XMH

 

Role of the equipment

Focused Ion Beam (FIB) integrated with a Scanning Electron Microscope (SEM) for TEM sample preparation
Gas Injection System (GIS) for deposition
Characteraization by energy dispersive spectroscopy (EDS)

 

Technical specifications

  - Electron optics

• Electron gun: - High brightness Schottky emittor
                         - Accelarating voltage: 200 V à 30 kV
• Probe current: 2 pA à 200 nA
• Resolution: in SE mode: 1.2 nm à 30 kV and 3 nm à 3 kV
                      in BSE mode: 2 nm à 30 kV
• Magnification: x1 to x1,000,000
 
  - Ion optics 
 
• Ion gun : Ga liquid metal
• Resolution : < 5 nm à 30 kV / < 2.5 nm à 30 kV (at the coïncidence point)
• Magnification : 150X to 1,000,000X
• Angle between MEB and FIB : 55°
• Accelerating voltage: 0.5 kV à 30 kV
 

Accessories

• EDS : Quantax Bruker detector (X-Flash 6160) for elemetal analysis
• Gas Injection System (5-GIS from Orsayphysics) equipped with 5 precursors for deposition
• OmniProbe 200 nanomaipulator from Oxford Instrument

 

Examples of available porcesses and services

• TEM sample preparation
• Secondaries (SEI) and backscattering (BSE) electrons imaging
• Identification and quantification of the elements by EDS

 

 

Gold nanoparticles observed by High resolution Scanning Electron Microscopy using the Tescan LYRA 3 XMH

 

Contact : Patrick Soucy