> Ebeam Writer VB6 UHR EWF

Role of the equipment

   The Vistec VB6 is an e-beam lithography tool able to define and position patterns on a wafer with resolutions close to the nanometer.

Technical specifications

• Acceleration voltage: 100 keV
• Current: 100 pA – 100 nA
• Field size: up to1200 um
• Resolution: process dependent. A typical resolution of 25 nm
   can be obtained without ultrasound development.
• Stiching accuracy :
   < 40 nm depending on the field size.
• Writing speed : 50 MHz
• Addressing: 20 bits
• Available substrate holders :
- Wafers: 50 mm, 75 mm, 100 mm, 125 mm, 150 mm.
- Photomasks: 125 mm, 150 mm, NIST X-RAY Holder
- Pieces: 1 cm and more
• Automatic focus correction during writing
• Intelligent stage with 0.6 nm precision

Accessories

• Standard CAD formats like GDSII, DXF, etc… are accepted
• Proximity error correction available

Examples of available processes and services

• Photonic crystals
• Bragg gratings
• Photomask prototypes
• Master molds for nano-imprint

Academic | Private sector Rate :
150 $/h | 500 $/h