Archives: Fiche technique

Sputtering system CMS-18

E-beam evaporator AXXIS

Pulsed Laser Deposition System PVD 3000

Pulsed Laser Deposition (PLD)

Mask aligner EVG620

Laser lithography, Heidelberg DWL-66 FS

E-beam lithography, Raith EBPG5200Plus