The SpinBall is a fully automated spin-coater platform for the deposition, the baking and the development of thin films like photoresist and ebeam resists.
• Fully automated with programmable recipes
• Either manual or automated photoresist deposition
• Manual or automated photoresist development
• Substrates: from small pieces up to 150 mm wafers
• Automated backside cleaning and edgebead removal on wafers
• Spin speed: 0 to6000 rpm +/- 1 rpm
• Acceleration: up to 50 krpm/s
• Proximitty baking plate: up to 250ºC +/- 0.1ºC
• Photomasks adaptator
• Photoresist and ebeam resists spin coating
• Resist development using agitated processes
