Role of the equipment
Chemical analysis of the surface (qualitative and quantitative).
Allow the study of the chemical bond and the electronic structure of the matter.
Technical specifications
• Twin polychromatic source :
- Aluminium Kα1,2 (hν = 1486.6eV)
- Magnésium Kα1,2 (hν = 1253.6eV)
→ resolution for the Ag3d5/2 peak = 1.0eV
• Aluminium monochromatic source Kα1,2 (hν = 1486.6eV)
→ resolution for the Ag3d5/2 peak = 0.6eV
• XL magnetic lens
• Charge compensation for non-conductive sample
• Ion beam etch of Argon (0.1 to 10keV), etching rate between 0.1 and 3nm/min
• Vacuum system :
- Main chamber : 10-10 mbar
- Preparation chamber : 10-9 mbar
Accessories
• UV source for UPS measurements
• Preparation chamber and fast entry lock
• Electrochemical cell for in-situ XPS measurements
Examples of available processes and services
• Angle resolved measurements (ARXPS)
• XPS Imaging (resolution < 10 µm)
• Depth profil of the species
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