Role of the equipment
The Tytan furnace is used for various thermal treatments like diffusion, dry and wet oxydation and also deposition of nitride and polysilicon thin films.
Technical specifications
• Tube 3: LPCVD with SiH4, SiH2Cl2 or NH3
• Tube 1: atmospheric tube with N2, O2, H2 and liquid source from Trans-LC
• Substrates: from small pieces up to 150 mm wafers
• Automatic substrate loading
• Programmable receipes
• Temperature controlled at +/- 1ºC on three zones (88 cm total length)
• Temperature : from 250ºC to 1275ºC
• Uniformity: better than 5% over 150 mm (1 sigma) for all processes
Accessories
• Internal torche for wet oxydation
Examples of available processes and services
• Nitride deposition for membrane
• Thermal diffusion of doped samples
• Wet or dry oxyde growing
• Low temperature oxyde growing (450ºC)
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Academic | Private sector Rate :
67 $/h | 145 $/h
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