Model : Tescan LYRA 3 XMH
Role of the equipmentFocused Ion Beam (FIB) integrated with a Scanning Electron Microscope (SEM) for TEM sample preparation
Gas Injection System (GIS) for insulating or conducting layer deposition
Characterization by energy dispersive spectroscopy (EDS)
Technical specifications- Electron optics • Electron gun: - High brightness Schottky emittor
- Accelarating voltage: 200 V à 30 kV
• Probe current: 10 pA à 15 nA
• Resolution: in SE mode: 1.2 nm à 30 kV and 3.0 nm à 3 kV
in BSE mode: 2.0 nm à 30 kV
• Magnification: 20x to 500,000x
- Ion optics
• Ion gun : Ga liquid metal
• Resolution : < 5 nm à 30 kV / < 2.5 nm à 30 kV (at the coïncidence point)
• Magnification : 150x to 250,000x
• Angle between MEB and FIB : 55°
• Accelerating voltage: 0.5 kV à 30 kV
Accessories• EDS : Quantax Bruker detector (X-Flash 6160) for elemetal analysis
• Gas Injection System (5-GIS from Orsayphysics) equipped with 5 precursors for deposition
• OmniProbe 200 nanomaipulator from Oxford Instrument
Examples of available porcesses and services• TEM sample preparation
• Secondary (SE) and backscattering (BSE) electrons imaging
• Identification and quantification of the elements by EDS
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Gold nanoparticles observed by High resolution Scanning Electron Microscopy using the Tescan LYRA 3 XMH |
Contact : Patrick Soucy